1.

Conference Proceedings
Conference Proceedings
1. Performance of a 1.35NA ArF immersion lithography system for 40-nm applications
J. de Klerk ; C. Wagner ; R. Droste ; L. Levasier ; L. Jorritsma ; E. van Setten ; H. Kattouw ; J. Jacobs ; T. Heil
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Orientation Zernike Polynomials: a systematic description of polarized imaging using high NA lithography lenses
T. Heil ; J. Ruoff ; J. T. Neumann ; M. Totzeck ; D. Krähmer
Pub. info.: Lithography Asia 2008.  1  pp.714018-1-714018-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140