Characterization of ArF immersion process for production (Invited Paper)
- Author(s):
Kohler, C. ( ASML Netherlands B.V. (Netherlands) ) de Boeij, W. ( ASML Netherlands B.V. (Netherlands) ) van Ingen-Schenau, K. ( ASML Netherlands B.V. (Netherlands) ) van de Kerkhof, M. ( ASML Netherlands B.V. (Netherlands) ) de Klerk, J. ( ASML Netherlands B.V. (Netherlands) ) Kok, H. ( ASML Netherlands B.V. (Netherlands) ) Swinkels, G. ( ASML Netherlands B.V. (Netherlands) ) Finders, J. ( ASML Netherlands B.V. (Netherlands) ) Mulkens, J. ( ASML Netherlands B.V. (Netherlands) ) Fiolka, D. ( Carl Zeiss SMT AG (Germany) ) Heil, T. ( Carl Zeiss SMT AG (Germany) ) - Publication title:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5754
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 13
- Page(to):
- 22
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- Language:
- English
- Call no.:
- P63600/5754
- Type:
- Conference Proceedings
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