1.

Conference Proceedings
Conference Proceedings
1. Advanced image placement performance for the current EPL masks [6151-53]
Eguchi, H. ; Sugimura, H. ; Koike, K. ; Sakaue, H. ; Arimoto, H. ; Ogawa, K. ; Susa, T. ; Kunitani, S. ; Kurosu, T. ; Yoshii, T. ; Itoh, K.
Pub. info.: Emerging Lithographic Technologies X.  pp.61511G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
2.

Conference Proceedings
Conference Proceedings
2. Feedforward correction of mask image placement for proximity electron lithography
Omori, S. ; Nohdo, S. ; Motohashi, T. ; Kitagawa, T. ; Susa, T. ; Yotsui, K. ; Itoh, K. ; Tamura, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.906-914,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
3.

Conference Proceedings
Conference Proceedings
3. Local IP evaluations of EPL reticle with 4 mm-sq Si membranes [5853-118]
Koike, K. ; Sakaue, H. ; Arimoto, H. ; Yamazaki, T. ; Sugimura, H. ; Susa, T. ; Itoh, K. ; Tamura, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.289-296,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
4.

Conference Proceedings
Conference Proceedings
4. Stencil pattern accuracy of EPL masks [5853-77]
Sugimura, H. ; Yamazaki, T. ; Susa, T. ; Negishi, Y. ; Yoshii, T. ; Eguchi, H. ; Tamura, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.884-891,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
5.

Conference Proceedings
Conference Proceedings
5. Image placement of large window-size membrane for EPL and LEEPL mask [5853-80]
Eguchi, H. ; Sumida, T. ; Susa, T. ; Negishi, Y. ; Kurosu, T. ; Yoshii, T. ; Yamazaki, T. ; Yotsui, K. ; Sugimura, H. ; Tamura, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.910-920,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
6.

Conference Proceedings
Conference Proceedings
6. Defect inspection strategy of LEEPL masks [5853-82]
Yonekura, I. ; Kunitani, S. ; Susa, T. ; Itoh, K. ; Tamura, A. ; Maruyama, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.933-943,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
7.

Conference Proceedings
Conference Proceedings
7. Global image placement of LEEPL mask
Eguchi, H. ; Susa, T. ; Sumida, T. ; Kurosu, T. ; Yoshii, T. ; Yotsui, K. ; Sugimura, H. ; Itoh, K. ; Tamura, A.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.935-942,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567