Blank Cover Image

Fluorinated Silicon Nitride Film Deposited at Low Temperatures from SiH4-SiF4-NH3

Author(s):
Publication title:
Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14-17, 1998, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
507
Pub. Year:
1999
Page(from):
471
Pub. info.:
Warrendale: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994133 [1558994130]
Language:
English
Call no.:
M23500/507
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings PACVD FLUORINATED SILICON NITRIDE FILMS DEPOSITED FROM SiF4/NH3 GAS MIXTURES

Castro, A., Gasset, M., Gomez-Aleixandre, C., Sanchez, O., Albella, J. M.

Materials Research Society
7 Conference Proceedings EFFECT OF RF PLASMA ON SILICON NITRIDE DEPOSITION FROM SiF4/NH3 GAS MIXTURES IN A HOT WALL REACTOR

Gomez, Aleixandre, C., Sanchez, O., Albella, J. M.

Materials Research Society
2 Conference Proceedings Preparation and Properties of PECVD Silicon Nitride Films from SIH4+ NH3 and/or NF3 and SiF4+ NH3 Gas Mixtures

Gomez-Aleixandre,C., Sanchez,O., Albella,J.M.

Trans Tech Publications
8 Conference Proceedings Effect of the Carrier Gases on the CVD of Tungsten from WF6-SiH4

Rhee, S.-W., Choi, H.-S., Park, S.-K., Shimogaki, Y., Komiyama, H.

Electrochemical Society
3 Conference Proceedings Effect of In Situ H2 Plasma Pretreatment on the Low Temeprature Microcrystalline (μc-Si:H) Silicon Film Deposited on Amorphous Si02 and SiNx:H Surfaces

Park, Y.-B., Rhee, S.-W.

Electrochemical Society
9 Conference Proceedings LIGHT-SOAKING OF a-Si:H,F FILMS DEPOSITED FROM SiF4 AND H2

Parl. H. R., Liu, J. Z., Maruyama, A., Wagner, S.

Materials Research Society
4 Conference Proceedings Mechanistic Studies of the CVD of Silicon Nitride from SiF4 and NH3

Buss, R.J., Ho, P.

Electrochemical Society
10 Conference Proceedings Deposition of Poly-Si by Remote Plasma CVD with Si2H6-SiF4

Rhee, S.-W., Lee, I.-J., Kim, D.-H.

American Institute of Chemical Engineers
5 Conference Proceedings High-Rate (＞ 1nm/s) and Low-Temperature (＜ 400℃) Deposition of Silicon Nitride Using an N2/SiH4 and NH3/SiH4 Expanding Thermal Plasma

Hong, J., Kessels, W. M. M., Sanden, M. C. M. van de

Materials Research Society
11 Conference Proceedings Structure of polycrystalline silicon films by glow-discharge decomposition using SiH4/H2/SiF4 at low temperature

Tsuchida, R., Syed, M., Inokuma, T., Kurata, Y., Hasegawa, S.

MRS-Materials Research Society
6 Conference Proceedings Low Temperature Growth of Nanocrystalline Silicon from SiF4 + SiH4

Chen, Yu, Taguchi, M., Wagner, S.

MRS - Materials Research Society
12 Conference Proceedings Enhancement of Crystallinity with Fluorinated Amorphous Silicon (a-Si:H;F) Film by XeCl Excimer Laser Annealing

Choi, H. S., Jang, K. H., Kim, K. B., Han, M. K.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12