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11 results

Conference Proceedings

1. Secondary-electron image profiles using bias voltage technique in deep contact hole

Ko,Y.-U. ; Joy,D.C. ; Sullivan,N.T. ; Mastovich,M.E.

Pub. info.:	Metrology, inspection, and process control for microlithography XV. pp.37-45, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344

Conference Proceedings

2. Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography

Fritze,M. ; Tyrrell,B. ; Astolfi,D.K. ; Davis,P. ; Wheeler,B. ; Mallen,R. ; Jarmolowicz,J. ; Cann,S.G. ; Chan,D.Y. ; Rhyins,P.D. ; Mastovich,M.E. ; Sullivan,N.T. ; Brandom,R. ; Carney,C. ; Fritze,M. ; Blachowicz,B.A.

Pub. info.:	Metrology, inspection, and process control for microlithography XV. pp.334-343, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344

Conference Proceedings

3. Redefining critical in critical dimension metrology

Askary,F. ; Sullivan,N.T.

Pub. info.:	Metrology, inspection, and process control for microlithography XV. pp.815-826, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344

Conference Proceedings

4. Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology

Allgair,J. ; Archie,C.N. ; Banke,W. ; Bogardus,H. ; Griffith,J.E. ; Marchman,H.M. ; Postek,M.T. ; Saraf,L.H. ; Schlesinger,J.E. ; Singh,B. ; Sullivan,N.T. ; Trimble,L.E. ; Vladar,A.E. ; Yanof,A.W.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.138-150, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

5. Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication

Fritze,M. ; Burns,J.M. ; Wyatt,P.W. ; Astolfi,D.K. ; Forte,T. ; Yost,D. ; Davis,P. ; Curtis,A.V. ; Preble,D.M. ; Cann,S.G. ; Denault,S. ; Liu,H.-Y. ; Shaw,J.C. ; Sullivan,N.T. ; Mastovich,M.E.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.388-407, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

6. Statistical verification of multiple CD-SEM matching

Erickson,D. ; Sullivan,N.T. ; Elliott,R.C.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XI. pp.93-100, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3050

Conference Proceedings

7. Application of attenuated phase-shift masks to sub-0.18-ｦﾌm logic patterns

Fritze,M. ; Wyatt,P.W. ; Astolfi,D.K. ; Davis,P. ; Curtis,A.V. ; Preble,D.M. ; Cann,S.G. ; Denault,S. ; Chan,D. ; Shaw,J.C. ; Sullivan,N.T. ; Brandom,R. ; Mastovich,M.E.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1179-1192, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

8. Investigation of the effects of charging in SEM-based CD metrology

Davidson,M.P. ; Sullivan,N.T.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XI. pp.226-242, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3050

Conference Proceedings

9. Importance of measurement accuracy in statistical process control

Askary,F. ; Sullivan,N.T.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.546-554, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

10.

Conference Proceedings

10. Measurement of a CD and sidewall angle artifact with two-dimensional CD AFM metrology

Dixson,R. ; Sullivan,N.T. ; Schneir,J. ; McWaid,T.H. ; Tsai,V.W. ; Prochazka,J.J. ; Young,M.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography X. pp.572-588, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2725

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Author: Sullivan,N.T.