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17 results

Conference Proceedings

1. Advanced image placement performance for the current EPL masks [6151-53]

Eguchi, H. ; Sugimura, H. ; Koike, K. ; Sakaue, H. ; Arimoto, H. ; Ogawa, K. ; Susa, T. ; Kunitani, S. ; Kurosu, T. ; Yoshii, T. ; Itoh, K.

Pub. info.:	Emerging Lithographic Technologies X. pp.61511G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6151

Conference Proceedings

2. Resolution improvement of EPL stencil mask using thin membrane [6151-52]

Sugimura, H. ; Eguchi, H. ; Norimoto, M. ; Negishi, Y. ; Yonekura, I. ; Ito, K. ; Tamura, A. ; Koba, F. ; Arimoto, H

Pub. info.:	Emerging Lithographic Technologies X. pp.61511F-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6151

Conference Proceedings

3. Image placement of large window-size membrane for EPL and LEEPL mask [5853-80]

Eguchi, H. ; Sumida, T. ; Susa, T. ; Negishi, Y. ; Kurosu, T. ; Yoshii, T. ; Yamazaki, T. ; Yotsui, K. ; Sugimura, H. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.910-920, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

4. Local IP evaluations of EPL reticle with 4 mm-sq Si membranes [5853-118]

Koike, K. ; Sakaue, H. ; Arimoto, H. ; Yamazaki, T. ; Sugimura, H. ; Susa, T. ; Itoh, K. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.289-296, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

5. Stencil pattern accuracy of EPL masks [5853-77]

Sugimura, H. ; Yamazaki, T. ; Susa, T. ; Negishi, Y. ; Yoshii, T. ; Eguchi, H. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.884-891, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

6. Nanomechanical properties of amorphous carbon and carbon nitride thin films prepared by shielded arc ion plating

Tajima, N. ; Saze, S. ; Sugimura, H. ; Takai, O.

Pub. info.:	Thin films - stresses and mechanical properties VIII : symposium held November 29-December 3, 1999, Boston, Massachusetts, U.S.A.. pp.319-, 2000. Warrendale, Pa.. MRS-Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	594

Conference Proceedings

7. Nanomechanical properties of amorphous carbon and carbon nitride thin films prepared by shielded arc ion plating

Tajima, N. ; Saze, H. ; Sugimura, H. ; Takai, O.

Pub. info.:	Amorphous and nanostructured carbon : sympoisum held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.. pp.371-, 2000. Warrendale, Pa.. MRS-Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	593

Conference Proceedings

8. Low-stress stencil masks using SOI substrates for EPL and LEEPL

Eguchi, H. ; Kurosu, T. ; Yoshii, T. ; Sugimura, H. ; Itoh, K. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.879-887, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

9. Global image placement of LEEPL mask

Eguchi, H. ; Susa, T. ; Sumida, T. ; Kurosu, T. ; Yoshii, T. ; Yotsui, K. ; Sugimura, H. ; Itoh, K. ; Tamura, A.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.935-942, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

10.

Conference Proceedings

10. 200-mm EPL stencil mask fabrication by using SOI substrate

Sugimura, H. ; Eguchi, H. ; Yoshii, T. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.925-933, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

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Author: Sugimura, H.