1.

Conference Proceedings
Conference Proceedings
1. New particle-inspection system for CMP-planarization-processed metal layers
Ikota,M. ; Sugimoto,A. ; Inoue,Y. ; Taguchi,J. ; Watanabe,T.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.336-345,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Advanced surface inspection techniques for SOI wafers
Nozoe,M. ; Sugimoto,A. ; Ikeda,T.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.488-492,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332