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15 results

Conference Proceedings

1. Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography

Kurose, E. ; Watanabe, K. ; Suganaga, T. ; Itani, T. ; Fujii, K.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.603-614, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

Conference Proceedings

2. 157-nm lithography with high numerical aperture lens for 70-nm technology node

Suganaga, T. ; Kanda, N. ; Kim, J.-H. ; Yamabe, O. ; Watanabe, K. ; Furukawa, T. ; Miyoshi, S. ; Itani, T. ; Cashmore, J.S. ; Gower, M.C.

Pub. info.:	Optical Microlithography XV. Part One pp.584-593, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

3. Feasibility study of SCAAM-type Alt-PSM for 157-nm lithography

Morikawa, Y. ; Kokubo, H. ; Noguchi, K. ; Sasaki, S. ; Mohri, H. ; Hoga, M. ; Kanda, N. ; Irie, S. ; Watanabe, K. ; Suganaga, T. ; Itani, T.

Pub. info.:	Optical Microlithography XVI. Part Two pp.1137-1145, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

4. Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography

Watanabe, K. ; Kurose, E. ; Suganaga, T. ; Itani, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.736-744, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

5. 157-nm lithography for 65-nm node SRAM-gate

Suganaga, T. ; Irie, S. ; Miyoshi, S. ; Kim, J.-H. ; Watanabe, K. ; Kurose, E. ; Furukawa, T. ; Hagiwara, T. ; Ishimaru, T. ; Itani, T.

Pub. info.:	Optical Microlithography XVI. Part One pp.261-269, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

6. Wavefront aberration measurement in 157-nm high numerical aperture lens

Kim, J.-H. ; Suganaga, T. ; Watanabe, K. ; Kanda, N. ; Itani, T. ; Cashmore, J.S. ; Gower, M.C.

Pub. info.:	Optical Microlithography XVI. Part Three pp.1408-1419, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

7. Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography

Irie, S. ; Kanda, N. ; Watanabe, K. ; Suganaga, T. ; Itani, T.

Pub. info.:	Optical Microlithography XV. Part Two pp.1654-1664, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

8. Feasibility study of TaSiOx-type Att-PSM for 157-nm lithography

Watanabe, K. ; Yamabe, O. ; Kanda, N. ; Kim, J. ; Uchida, N. ; Irie, S. ; Suganaga, T. ; Itani, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.444-451, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

9. Advances in resist pattern transfer process using 157-nm lithography

Furukawa, T. ; Hagiwara, T. ; Kawaguchi, E. ; Matsunaga, K. ; Suganaga, T. ; Itani, T. ; Fujii, K.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.1064-1073, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

10.

Conference Proceedings

10. 157-nm lithography with extremely high numerical aperture lens for 45-nm technology node

Suganaga, T. ; Lee, J.-W. ; Kurose, E. ; Ishimaru, T. ; Furukawa, T. ; Itani, T. ; Fujii, K. ; Cashmore, J.S. ; Gower, M.

Pub. info.:	Optical Microlithography XVII. pp.104-115, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

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Author: Suganaga, T.