1.

Conference Proceedings
Conference Proceedings
1. Phenolic Resin-Based Negative Electron-Beam Resists
Shiraishi, H. ; Hayashi, N. ; Ueno, T. ; Suga, O. ; Murai, F. ; Nonogaki, S.
Pub. info.: Polymers for high technology : electronics and photonics.  pp.77-,  1987.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 346
2.

Conference Proceedings
Conference Proceedings
2. Radiation Chemistry of Phenolic Resin Containing Epoxy and Azide Compounds
Shiraishi, H. ; Ueno, T. ; Suga, O. ; Nonogaki, S.
Pub. info.: Materials for microlithography : radiation-sensitive polymers.  pp.423-,  1984.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 266
3.

Conference Proceedings
Conference Proceedings
3. The novel approach for optical proximity correction using genetic algorithms [5992-176]
Matsunawa, T. ; Nosato, H. ; Sakanashi, H. ; Murakawa, M. ; Murata, N. ; Terasawa, T. ; Tanaka, T. ; Yoshioka, N. ; Suga, O. ; Higuchi, T.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599254-599254,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
4.

Conference Proceedings
Conference Proceedings
4. Advanced photomask repair technology for 65 nm lithography (4) [5992-170]
Itou, Y. ; Tanaka, Y. ; Suga, O. ; Sugiyama, Y. ; Hagiwara, R. ; Takahashi, H. ; Takaoka, O. ; Kozakai, T. ; Matsuda, O. ; Suzuki, K. ; Okabe, M. ; Kikuchi, S. ; Uemoto, A. ; Yasaka, A. ; Adachi, T.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59924Y-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
5.

Conference Proceedings
Conference Proceedings
5. Application of the unified mask data format based on OASIS for VSB EB writers [5992-195]
Suzuki, T. ; Hirumi, J. ; Suga, O.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59924F-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
6.

Conference Proceedings
Conference Proceedings
6. Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond (Invited Paper) [6283-130]
Kikuiri, N. ; Murakami, S. ; Tsuchiya, H. ; Tateno, M. ; Takahara, K. ; Imai, S. ; Hirano, R. ; Isomura, I. ; Tsuji, Y. ; Tamura, Y. ; Matsumura, K. ; Usuda, K. ; Otaki, M. ; Suga, O. ; Ohira, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830Y-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
7.

Conference Proceedings
Conference Proceedings
7. Advanced photomask repair technology for 65nm lithography (5) [6283-108]
Aramaki, F. ; Kozakai, T. ; Sugiyama, Y. ; Muramatsu, M. ; Koyama, Y. ; Matsuda, O. ; Suzuki, K. ; Okabe, M. ; Hagiwara, R. ; Yasaka, A. ; Adachi, T. ; Tanaka, Y. ; Suga, O. ; Nishida, N. ; Usui, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628310-628310,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283