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11 results

Conference Proceedings

1. Effect of real masks on wafer patterning

Spence,C.A. ; Subramanian,R. ; Teng,D. ; Gallardo,E.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.54-62, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

2. Optimal sampling strategies for sub-100-nm overlay

Rangarajan,B. ; Templeton,M.K. ; Capodieci,L. ; Subramanian,R. ; Scranton,A.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.348-359, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

3. Extending the limits of i-line lithography for via layers and minimization of dense-iso bias

Subramanian,R. ; Spence,C.A. ; Capodieci,L. ; Werner,T. ; Gallardo,E.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.914-922, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

4. Physically based model for predicting volume shrinkage in chemically amplified resists

Jakatdar,N.H. ; Bao,J. ; Spanos,C.J. ; Subramanian,R. ; Rangarajan,B. ; Romano,A.R.

Pub. info.:	In-line characterization, yield reliability, and failure analysis in microelectronics manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.16-24, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3743

Conference Proceedings

5. Sampling requirements for the analysis of misregistration

Subramanian,R. ; Heavlin,W.D. ; Coons,E.M. ; Rangarajan,B.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.665-674, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

6. Methodology for the optimization of an i-line lithographic process for defect reduction

Phan,K.A. ; Bains,G. ; Steele,D.A. ; Orth,J.A. ; Subramanian,R.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.309-320, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

7. Automated OPC optimization using in-line CD-SEM

Su,B. ; Menaker,M. ; Haas,N. ; Subramanian,R. ; Singh,B.

Pub. info.:	Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA. pp.80-86, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4181

Conference Proceedings

8. Spectroscopic characterization of acid mobility in chemically amplified resists

Jessop,J.L.P. ; Goldie,S.N. ; Scranton,A.B. ; Blanchard,G.J. ; Rangarajan,B. ; Okoroanyanwu,U. ; Subramanian,R. ; Templeton,M.K.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.161-170, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

9. Process control and optimization of conventional metal process for 0.18-ｦﾌm logic technology

Subramanian,R. ; Brown,S.E. ; Chen,S.H. ; Morales,C. ; Gallardo,E. ; Singh,B.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.178-186, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

10.

Conference Proceedings

10. Deep-UV reflection control for patterning dielectric layers

Subramanian,R. ; Bains,G.S. ; Lyons,C.F. ; Singh,B. ; Gallardo,E.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.356-370, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

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