1.

Conference Proceedings
Conference Proceedings
1. Implementation of a closed-loop CD and overlay controller for sub-0.25-ｦﾌm patterning
Sturtevant,J.L. ; Weilemann,M.R. ; Green,K.G. ; Dwyer,J. ; Robertson,E. ; Hershey,R.R.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.461-470,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Characterization of CD control for sub-0.18-ｦﾌm lithographic patterning
Sturtevant,J.L. ; Allgair,J. ; Fu,C.-C. ; Green,K.G. ; Hershey,R.R. ; Kling,M.E. ; Litt,L.C. ; Lucas,K.D. ; Roman,B.J. ; Seligman,C.S. ; Schippers,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.220-227,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Photosensitization in dyed and undyed APEX-E DUV resist
Sturtevant,J.L. ; Conley,W.E. ; Webber,S.E.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.273-286,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
4.

Conference Proceedings
Conference Proceedings
4. Practicing extension of 248-nm DUV optical lithography using trim-mask PSM
Kling,M.E. ; Cave,N. ; Falch,B.J. ; Fu,C.-C. ; Green,K.G. ; Lucas,K.D. ; Roman,B.J. ; Reich,A.J. ; Sturtevant,J.L. ; Tian,R. ; Russell,D.R. ; Karklin,L. ; Wang,Y.-T.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.10-17,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
5.

Conference Proceedings
Conference Proceedings
5. Development of an i-line attenuated phase shift process for dual inlay interconnect lithography
Sturtevant,J.L. ; Ho,B.C.P. ; Geiszler,V.C. ; Herrick,M.T. ; King,C.F. ; Carter,R.L. ; Roman,B.J. ; Litt,L.C. ; Smith,B. ; Strozewski,K.J.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.505-512,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
6.

Conference Proceedings
Conference Proceedings
6. Calibration of chemically amplified resist models
Byers,J.D. ; Petersen,J.S. ; Sturtevant,J.L.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.156-162,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
7.

Conference Proceedings
Conference Proceedings
7. Removable organic antireflection coating
Sturtevant,J.L. ; Insalaco,L.J. ; Flaim,T. ; Krishnamurthy,V. ; Meador,J.D. ; Petersen,J.S. ; Eckert,A.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.738-746,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
8.

Conference Proceedings
Conference Proceedings
8. Theoretical and experimental optimization of numerical aperture and partial coherence for complementary phase-shift processes
Brodsky,C.J. ; Nelson-Thomas,C. ; Cave,N. ; Sturtevant,J.L.
Pub. info.: Optical Microlithography XIV.  4346  pp.755-761,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
9.

Conference Proceedings
Conference Proceedings
9. Characterization of optical proximity correction features
Allgair,J.A. ; Ivy,M. ; Lucas,K. ; Sturtevant,J.L. ; Elliott,R.C. ; Mack,C.A. ; MacNaughton,C.W. ; Miller,J.D. ; Pochkowski,M. ; Preil,M.E. ; Robinson,J.C. ; Santos,F.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.200-207,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
10.

Conference Proceedings
Conference Proceedings
10. Experimental determination of the impact of polysilicon LER on sub-100-nm transistor performance
Patterson,K. ; Sturtevant,J.L. ; Alvis,J.R. ; Benavides,N. ; Bonser,D. ; Cave,N. ; Nelson-Thomas,C. ; Taylor,W.D. ; Turnquest,K.L.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.809-814,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344