1.

Conference Proceedings
Conference Proceedings
1. Chip-scale 3D topography synthesis
Niewczas,M. ; Li,X. ; Strojwas,A.J. ; Maly,W.P.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.785-794,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Metropole-3D: a rigorous 3D topography simulator
Li,X. ; Lucas,K.D. ; Swecker,A.L. ; Strojwas,A.J.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.717-728,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
3.

Conference Proceedings
Conference Proceedings
3. Modeling of defect propagation/growth for yield impact prediction in VLSI manufacturing
Li,X. ; Strojwas,A.J. ; Swecker,A.L. ; Reddy,M. ; Milor,L. ; Lin,Y.-T.
Pub. info.: Microelectronic Manufacturing Yield, Reliability, and Failure Analysis III.  pp.167-178,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3216
4.

Conference Proceedings
Conference Proceedings
4. Comparison of defect detection schemes using rigorous 3D EM field simulations
Swecker,A.L. ; Strojwas,A.J. ; Levy,A. ; Bell,B.R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.313-321,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050
5.

Conference Proceedings
Conference Proceedings
5. Application of rigorous topography simulation for modeling of defect propagation/growth in VLSI fabrication
Li,X. ; Reddy,M. ; Strojwas,A.J. ; Milor,L. ; Lin,Y.T.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.322-331,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050
6.

Conference Proceedings
Conference Proceedings
6. Accurate prediction of kill ratios based on KLA defect inspection and critical area analysis
Elias,A. ; Strojwas,A.J. ; Maly,W.P. ; Nurani,R.
Pub. info.: Microelectronic Manufacturing Yield, Reliability, and Failure Analysis II.  pp.75-84,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2874
7.

Conference Proceedings
Conference Proceedings
7. Efficient workstation-based 3D model for optical alignment simulation
Lucas,K.D. ; Yuan,C.-M. ; Strojwas,A.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.436-447,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725