1.

Conference Proceedings
Conference Proceedings
1. Alternating PSM optimization using model-based OPC
Tritchkov,A. ; Stirniman,J.P. ; Rieger,M.L.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.556-566,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Understanding the parameters for strong phase-shift mask lithography
Tritchkov,A.V. ; Stirniman,J.P. ; Mayhew,J.P. ; Rieger,M.L.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1336-1346,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Optical proximity effects correction at 0.25ｦﾌm incorporating process variations in lithography
Tritchkov,A. ; Rieger,M.L. ; Stirniman,J.P. ; Yen,A. ; Ronse,K. ; Vandenberghe,G. ; hove,L.Van den
Pub. info.: Optical Microlithography X.  pp.726-738,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
4.

Conference Proceedings
Conference Proceedings
4. Customizing proximity correction for process-specific objectives
Rieger,M.L. ; Stirniman,J.P.
Pub. info.: Optical Microlithography IX.  Part2  pp.651-659,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
5.

Conference Proceedings
Conference Proceedings
5. Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process
Palmer,S.R. ; Mason,M.E. ; Randall,J.N. ; Aton,T. ; Kim,K. ; Tritchkov,A.V. ; Burdorf,J. ; Rieger,M.L. ; Stirniman,J.P.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.921-932,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
6.

Conference Proceedings
Conference Proceedings
6. Spatial-filter models to describe IC lithographic behavior
Stirniman,J.P. ; Rieger,M.L.
Pub. info.: Optical Microlithography X.  pp.469-478,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
7.

Conference Proceedings
Conference Proceedings
7. Mask fabrication rules for proximity-corrected patterns
Rieger,M.L. ; Stirniman,J.P.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.323-332,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884