Cost and revenue impact of advanced process control (APC) with an emphasis on run-to-run control (R2R)
- Author(s):
Stanley, T.D. ( International SEMATECH (USA) ) Markle, R.J. ( Advanced Micro Devices, Inc. (USA) ) Eck, B.V. ( International SEMATECH (USA) ) Cusson, B.K. ( Advanced Micro Devices, Inc. (USA) ) Purdy, M.A. ( Advanced Micro Devices, Inc. (USA) ) Stanley, K.J. ( International SEMATECH (USA) ) - Publication title:
- Advanced process control and automation : 27 February, 2003, Santa Clara, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5044
- Pub. Year:
- 2003
- Page(from):
- 130
- Page(to):
- 138
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448491 [0819448494]
- Language:
- English
- Call no.:
- P63600/5044
- Type:
- Conference Proceedings
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