1.

Conference Proceedings
Conference Proceedings
1. THE CONTROL OF BORON AUTO-DOPING DURING DEVICE PROCESSING FOR P/P+ EPI WAFERS WITH NO BACK-SURFACE OXIDE SEAL
Binns, M.I. ; Kommu, S. ; Seacrist, M.R. ; Standley, R.W. ; Wise, R. ; Myers, D.J. ; Tisserand, D. ; Doyle, D.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.682-693,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
2.

Conference Proceedings
Conference Proceedings
2. Investigation of second-harmonic generation for SOI wafer metrology
Pasternak, R. ; Jun, B. ; Schrimpf, R.D. ; Fleetwood, D.M. ; Alles, M.A. ; Dolan, R.P. ; Standley, R.W. ; Tolk, N.H.
Pub. info.: Silicon-on-insulator technology and devices XII : proceedings of the international symposium.  pp.383-388,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-03
3.

Conference Proceedings
Conference Proceedings
3. THE CONTROL OF BORON AUTO-DOPING DURING DEVICE PROCESSING FOR P/P+ EPI WAFERS WITH NO BACK-SURFACE OXIDE SEAL
Binns, M.J. ; Kommu, S. ; Seacrist, M.R. ; Standley, R.W. ; Wise, R. ; Myers, D.J. ; Tisserand, D. ; Doyle, D.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.682-693,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2