Spitznagel, J. A. ; Wood. Susan ; Choyke, W. J. ; Devaty, R. P. ; Ruan, J.
Pub. info.:
Ion beam processing of advanced electronic materials : symposium held April 25-27, 1989, San Diego, California, U.S.A.. pp.113-118, 1989. Pittsburgh, Pa.. Materials Research Society
Choyke, W. J. ; Spitznagel, J. A. ; Doyle, N. J. ; Wood, S. ; Irwin, R. B.
Pub. info.:
Impurity diffusion and gettering in silicon : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A.. pp.187-192, 1985. Pittsburgh, Pa.. Materials Research Society
Spitznagel, J. A. ; Hall, B. O. ; Doyle, N. J. ; Jayram, R. ; Wallace, R. W. ; Townsend, J. R. ; Miller, M.
Pub. info.:
Ion implantation and ion beam processing of materials : symposium held November 1983 in Boston, Massachusetts, U.S.A.. pp.597-602, 1984. New York. North-Holland
Jayaram, R. ; Spitznagel, J. A. ; Meier, D. L. ; Greggi, J. ; Burke, M.
Pub. info.:
Characterization of defects in materials : symposium held December 1-2, 1986, Boston, Massachusetts, U.S.A.. pp.271-276, 1987. Pittsburgh, Pa.. Materials Research Society
Choyke, W. J. ; Irwin, R. B. ; McCruerr, J. N. ; Townsend, J. R. ; Doyle, N. J. ; Hall, B. O. ; Spitznagel, J. A. ; Wood, S.
Pub. info.:
Ion implantation and ion beam processing of materials : symposium held November 1983 in Boston, Massachusetts, U.S.A.. pp.359-364, 1984. New York. North-Holland