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26 results

Conference Proceedings

1. Vacuum delay effect of CAR in mask fabrication

Kim,C.-H. ; Jeon,C.-U. ; Han,S.-J. ; Cho,W.-I. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.285-293, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

2. Application of e-beam chemically amplified resist to devices below 0.18-μm node

Jeon,C.-U. ; Kim,C.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	17th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.160-163, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4349

Conference Proceedings

3. Evaluation of lens aberrations depending on the transmittance of DUV-attenuated PSM

Park,J.-H. ; Kim,Y.-H. ; Lim,S.-C. ; Lee,K.-H. ; Choi,S.-W. ; Yoon,H.-S. ; Sohn,J.-M.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.937-942, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

4. Analysis of photomask CD errors depending on development methods

Moon,S.-Y. ; Ki,W.-T. ; Cha,B.-C. ; Choi,S.-W. ; Yoon,H.-S. ; Sohn,J.-M.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.573-576, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

5. Doubly exposed patterning characteristics using two alternating phase-shift masks

Lee,S.-W. ; Shin,I.-G. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Yoon,H.-S. ; Sohn,J.-M.

Pub. info.:	17th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.32-36, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4349

Conference Proceedings

6. Analysis of dry etch loading effect in mask fabrication

Lee,J.-Y. ; Cho,S.-Y. ; Kim,C.-H. ; Lee,S.-W. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.609-615, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

Conference Proceedings

7. Comparative study on MEEF and dose latitude between attenuated PSM and Cr Binary masks

Cho,H.-J. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.17-23, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

Conference Proceedings

8. Effect of beam blur in mask fabrication

Yang,S.-H. ; Ki,W.-T. ; Moon,S.-Y. ; Jeong,T.-M. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.468-473, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

Conference Proceedings

9. Mask considerations for manufacturing assist features

Choi,J.-H. ; Cho,W.-I. ; Kim,B.-S. ; Yang,S.-H. ; Moon,S.-Y. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	Optical Microlithography XIV. 4346 pp.131-140, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

10.

Conference Proceedings

10. Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks

Lee,S.-W. ; Chung,D.-H. ; Shin,I.-G. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	Optical Microlithography XIV. 4346 pp.762-769, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

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Author: Sohn,J.-M.