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Conference Proceedings

1. Calibration strategies for overlay and registration metrology

Silver, R.M. ; Stocker, M.T. ; Attota, R. ; Bishop, M. ; Jun, J.-S.J. ; Marx, E. ; Davidson, M.P. ; Larrabee, R.D.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVII. 1 pp.103-120, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5038

Conference Proceedings

2. Overlay metrology simulations: analytical and experimental validations

Seligson, J.L. ; Golovanevsky, B. ; Poplawski, J.M. ; Adel, M.E. ; Silver, R.M.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVII. 1 pp.61-69, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5038

Conference Proceedings

3. Comparison of measured optical image profiles of silicon lines with two different theoretical models

Silver, R.M. ; Attota, R. ; Stocker, M. ; Jun, J.J. ; Marx, E. ; Larrabee, R.D. ; Russo, B. ; Davidson, M.P.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVI. Part One pp.409-429, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4689

Conference Proceedings

4. New method to enhance overlay tool performance

Attota, R. ; Silver, R.M. ; Stocker, M.T. ; Marx, E. ; Jun, J.-S.J. ; Davidson, M.P. ; Larrabee, R.D.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVII. 1 pp.428-436, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5038

Conference Proceedings

5. Improving the uncertainty of photomask linewidth measurements

Pedulla, J.M. ; Potzick, J. ; Silver, R.M.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.317-327, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

Conference Proceedings

6. High-resolution optical overlay metrology

Silver, R.M. ; Attota, R. ; Stocker, M. ; Bishop, M. ; Jun, J.-S.J. ; Marx, E. ; Davidson, M.P. ; Larrabee, R.D.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.78-95, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

Conference Proceedings

7. Evaluation of new in-chip and arrayed line overlay target designs

Attota, R. ; Silver, R.M. ; Bishop, M. ; Marx, E. ; Jun, J.-S.J. ; Stocker, M. ; Davidson, M.P. ; Larrabee, R.D.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.395-402, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

Conference Proceedings

8. New design and uncertainty budget for a metrology UHV-STM used in direct measurements of atom spacings

Gonda, S. ; Zhou, H. ; Fu, J. ; Silver, R.M.

Pub. info.:	Nanostructure Science, Metrology, and Technology. pp.125-131, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4608

Conference Proceedings

9. Effects of etching time and wafer miscut on the morphology of etched Si(111) surfaces

Zhou, H. ; Fu, J. ; Gonda, S. ; Silver, R.M.

Pub. info.:	Nanostructure Science, Metrology, and Technology. pp.168-175, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4608

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Conference Proceedings

10. Overlay tool comparison for sub-130-nm technologies

Russo, B. ; Bishop, M. ; Benoit, D.C. ; Silver, R.M.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVI. Part One pp.261-272, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4689

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Author: Silver, R.M.