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33 results

Conference Proceedings

1. KINETICS OF THERMAL DECOMPOSITION OF GROUP-III METAL ALKYLS ON GaAs(100)

Donnelly, V.M. ; McCaulley, J.A. ; Shul, R.J.

Pub. info.:	Chemical perspectives of microelectronic materials II : symposium held November 26-28, 1990, Boston, Massachusetts, U.S.A.. pp.15-24, 1991. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	204

Conference Proceedings

2. GaN Metal Oxide Semiconductor Field Effect Transistors

Ren, F. ; Pearton, S.J. ; Abernathy, C.R. ; Baca, A.G. ; Cheng, P. ; Han, J. ; Shul, R.J. ; Chu, S.N.G. ; Hong, M. ; Lothian, J.R.

Pub. info.:	Proceedings of the State-of-the-Art Program on Compound Semiconductors (SOTAPOCs XXX). pp.169-173, 1999. Pennington, N. J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	99-4

Conference Proceedings

3. Hydrogen Incorporation into III-V Nitrides During Processing

Pearton, S.J. ; Shul, R.J. ; Wilson, R.G. ; Ren, F. ; Zavada, J.M. ; Abernathy, C.R. ; Vartuli, C.B. ; Lee, J.W. ; Mileham, J.R. ; MacKenzie, J.D.

Pub. info.:	Proceedings of the Symposium on Wide Bandgap Semiconductors and Devices and the Twenty-Third State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXIII). pp.178-186, 1995. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	95-21

Conference Proceedings

4. ECR Etching of Group-III Nitride Binary and Ternary Films

Shul, R.J. ; Howard, A.J. ; Pearton, S.J. ; Abernathy, C.R. ; Variuli, C.B. ; Barnes, P.A.

Pub. info.:	Proceedings of the Symposium on Wide Bandgap Semiconductors and Devices and the Twenty-Third State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXIII). pp.217-230, 1995. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	95-21

Conference Proceedings

5. High Microwave Power ECR Etching of III-V Semiconductors in CH4/H2/Ar

Lee, J.W. ; Pearton, S.J. ; Lambers, E.S. ; Mileham, J.R. ; Abernathy, C.R. ; Hobson, W.S. ; Ren, F. ; Shul, R.J.

Pub. info.:	Proceedings of the Twenty-fourth State-of-the-Art Program on Compound Semiconductors. pp.203-213, 1996. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	96-2

Conference Proceedings

6. High temperature Stable W and WSi contacts on n- and p-GaN

Cao, X.A. ; Ren, F. ; Pearton, S.J. ; Zeitouny, A. ; Eisenber, M. ; Zopler, J.C. ; Abernathy, C.R. ; Han, J. ; Shul, R.J. ; Lothian, J.R.

Pub. info.:	Proceedings of the third Symposium on III-V Nitride Materials and Processes. pp.208-214, 1998. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	98-18

Conference Proceedings

7. Microfuel Cell with a Porous Silicon Nitride Membrane Electrode Assembly

Kravitz, S.H. ; Apblett, C.A. ; Schmidt, C.F. ; Beggans, M.H. ; Ingersoll, D. ; Shul, R.J. ; Hecht, A.M.

Pub. info.:	Micropower and microdevices : proceedings of the international symposium. pp.146-157, 2002. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-25

Conference Proceedings

8. Deep High-Aspect Ratio Si Etching For Advanced Packaging Technologies

Shul, R.J. ; Willison, C.G. ; Sullivan, C.T. ; Kravitz, S.H. ; Zhang, L. ; Zipperian, T.E.

Pub. info.:	Proceedings of the Symposium on Light Emitting Devices for Optoelectronic Applications and the Twenty-Eighth State-of-the-Art Program on Compound Semiconductors. pp.564-572, 1998. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	98-2

Conference Proceedings

9. Electron Cyclotron Resonance Chemical Vapor Deposited Silicon Nitride for T-gate Passivation

Ren, F. ; LaRoche, J. ; Anderson, T. ; Pearton, S.J. ; Lee, J.W. ; Johnson, D. ; Lothian, J.R. ; Lin, J. ; Weiner, J.S. ; Shul, R.J. ; Wu, C.S.

Pub. info.:	Proceedings of the Symposium on Light Emitting Devices for Optoelectronic Applications and the Twenty-Eighth State-of-the-Art Program on Compound Semiconductors. pp.513-519, 1998. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	98-2

10.

Conference Proceedings

10. The Role of Plasma Chemistry and Ion Density in Dry Etching of Nitrides

Vartuli, C.B. ; Pearton, S.J. ; Abernathy, C.R. ; Shul, R.J. ; Ren, F.

Pub. info.:	Proceedings of the Second Symposium on III-V Nitride Materials and Processes. pp.39-56, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-34

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