1.

Conference Proceedings
Conference Proceedings
1. Microswelling-free negative resists for ArF excimer laser lithography utilizing acid-catalyzed intramolecular esterification
Hattori, T. ; Tsuchiya, Y. ; Yokoyama, Y. ; Oizumi, H. ; Morisawa, T. ; Yamaguchi, A. ; Shiraishi, H.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.411-419,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. A new 193nm resist
Hirayama, T. ; Shiono, D. ; Matsumaru, S. ; Ogata, T. ; Hada, H. ; Onodera, J. ; Arai, T. ; Sakamizu, T. ; Yamaguchi, A. ; Shiraishi, H. ; Fukuda, H. ; Ueda, M.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.122-130,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
3.

Conference Proceedings
Conference Proceedings
3. Neutron Scattering Study of Magnetic Phases in (Fe1-xCox)Ge2
Menshikov, A. Z. ; Dorofeyev, Yu. A. ; Teplykh, A. E. ; Shiraishi, H.
Pub. info.: EPDIC 6 : proceedings of the sixth European Powder Diffraction Conference, held August 22-25, 1998 in Budapest, Hungary.  pp.688-693,  2000.  Zuerich-Uetikon, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 321-324(2)
4.

Conference Proceedings
Conference Proceedings
4. LUNAR-A Mission: Science Objectives and Instruments
Mizutani, H. ; Fujimura, A. ; Hayakawa, M. ; Tanaka, S. ; Shiraishi, H. ; Yoshida, S.
Pub. info.: Proceedings of the fourth International Conference on Exploration and Utilisation of the Moon, ICEUM 4, 10-14 July 2000, ESTEC, Noordwijk, the Netherlands.  pp.107-114,  2000.  Noordwijk, The Netherlands.  ESA Publications Division
Title of ser.: ESA SP
Ser. no.: 462
5.

Conference Proceedings
Conference Proceedings
5. A Silicon-Containing Positive Photoresist Developable with Aqueous Alkaline Solution
Hayashi, N. ; Ueno, T. ; Shiraishi, H. ; Nishida, T. ; Toriumi, M. ; Nonogaki, S.
Pub. info.: Polymers for high technology : electronics and photonics.  pp.211-,  1987.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 346
6.

Conference Proceedings
Conference Proceedings
6. Phenolic Resin-Based Negative Electron-Beam Resists
Shiraishi, H. ; Hayashi, N. ; Ueno, T. ; Suga, O. ; Murai, F. ; Nonogaki, S.
Pub. info.: Polymers for high technology : electronics and photonics.  pp.77-,  1987.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 346
7.

Conference Proceedings
Conference Proceedings
7. Radiation Chemistry of Phenolic Resin Containing Epoxy and Azide Compounds
Shiraishi, H. ; Ueno, T. ; Suga, O. ; Nonogaki, S.
Pub. info.: Materials for microlithography : radiation-sensitive polymers.  pp.423-,  1984.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 266
8.

Conference Proceedings
Conference Proceedings
8. Molecular resists based on cholate derivatives for electron-beam lithography [6153-87]
Shiono, D. ; Hirayama, T. ; Hada, H. ; Onodera, J. ; Arai, T. ; Yamaguchi, A. ; Kojima, K. ; Shiraishi, H. ; Fukuda, H.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.61532D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
9.

Conference Proceedings
Conference Proceedings
9. Surface and line-edge roughness in acid-breakable resin-based positive resist
Sakamizu, T. ; Shiraishi, H.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.492-501,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039