1.

Conference Proceedings
Conference Proceedings
1. A new 193nm resist
Hirayama, T. ; Shiono, D. ; Matsumaru, S. ; Ogata, T. ; Hada, H. ; Onodera, J. ; Arai, T. ; Sakamizu, T. ; Yamaguchi, A. ; Shiraishi, H. ; Fukuda, H. ; Ueda, M.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.122-130,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Molecular resists based on cholate derivatives for electron-beam lithography [6153-87]
Shiono, D. ; Hirayama, T. ; Hada, H. ; Onodera, J. ; Arai, T. ; Yamaguchi, A. ; Kojima, K. ; Shiraishi, H. ; Fukuda, H.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.61532D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153