Optical proximity correction of alternating phase-shift masks for 0.18-ｦﾌm KrF lithography

Optical proximity correction of alternating phase-shift masks for 0.18-ｦﾌm KrF lithography

Author(s):

Publication title:

Optical Microlithography X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3051

Pub. Year:

1997

Page(from):

751

Page(to):

762

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424655 [081942465X]

Language:

English

Call no.:

P63600/3051

Type:

Conference Proceedings

Details

TDL ID:	ZA00016573
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	1997 : 10th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1997.03.12-1997.03.14

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