1.

Conference Proceedings
Conference Proceedings
1. Photochromism and Luminescence Properties of 2-(2,4-Dinitrobenzyl)Pyrldine Dispersed In Polymer Films
Shinohara, S. ; Takeda, J. ; Ooike, T. ; Kurita, S.
Pub. info.: Proceedings of the International Conference on Excitonic Processes in Condensed Matter : EXCON '98.  pp.141-146,  1998.  Pennington, N. J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-25
2.

Conference Proceedings
Conference Proceedings
2. Electronic State and Vibrational Structure of a Photochromic 2-(2,4-Dinitrobenzyl)Pyridlne Single Crystal
Takeda, J. ; Shinohara, S. ; Eguchi, N. ; Ohishi, S. ; Kurita, S. ; Kodaira, T.
Pub. info.: Proceedings of the International Conference on Excitonic Processes in Condensed Matter : EXCON '98.  pp.135-140,  1998.  Pennington, N. J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-25
3.

Technical Paper
Technical Paper
3. Feasibility Study of Electrodeless Magnetoplasmadynamic Acceleration
Toki, K. ; Shinohara, S. ; Tanikawa, T. ; Shamrai, K.
Pub. info.: AIAA meeting papers on disc.  2004.  [Reston, Va.].  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA/ASME/SAE/ASEE Joint Propulsion Conference and Exhibit
Ser. no.: 40th
4.

Conference Proceedings
Conference Proceedings
4. Advanced FIB mask repair technology for 100-nm/ArF lithography: II
Hagiwara, R. ; Yasaka, A. ; Aita, K. ; Takaoka, O. ; Koyama, Y. ; Kozakai, T. ; Doi, T. ; Muramatsu, M. ; Suzuki, K. ; Sugiyama, Y. ; Matsuda, O. ; Okabe, M. ; Shinohara, S. ; Hasuda, M. ; Adachi, T. ; Morikawa, Y. ; Nishiguchi, M. ; Sato, Y. ; Hayashi, N. ; Ozawa, T. ; Tanaka, Y. ; Yoshioka, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.510-519,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
5.

Conference Proceedings
Conference Proceedings
5. Advanced FIB mask repair technology for 100-nm/ArF lithography
Hagiwara, R. ; Yasaka, A. ; Aita, K. ; Takaoka, O. ; Koyama, Y. ; Kozakai, T. ; Doi, T. ; Muramatsu, M. ; Suzuki, K. ; Sugiyama, Y. ; Sawaragi, H. ; Okabe, M. ; Shinohara, S. ; Hasuda, M. ; Adachi, T. ; Morikawa, Y. ; Nishiguchi, M. ; Sato, Y. ; Hayashi, N. ; Ozawa, T. ; Tanaka, Y. ; Yoshioka, N.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1056-1064,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889