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10 results

Conference Proceedings

1. Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography

Koo,S.-S. ; Kim,S.-J. ; Paek,S.-W. ; Ahn,C.-N. ; Ham,Y.-M. ; Shin,K.-S.

Pub. info.:	Optical Microlithography XIV. 4346 pp.770-777, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

2. Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography

Yune,H.-S. ; Kim,H.-B. ; Kim,W.-H. ; Ahn,C.-N. ; Ham,Y.-M. ; Shin,K.-S.

Pub. info.:	Optical Microlithography XIV. 4346 pp.241-250, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

3. Feasibility study of printing sub-100-nm with ArF lithography

Kim,S.-K. ; Hong,J.-G. ; Park,J.-O. ; Yoo,T.-J. ; Hyun,Y.-S. ; Bok,C.-K. ; Shin,K.-S.

Pub. info.:	Optical Microlithography XIV. 4346 pp.214-221, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

4. "Novel chemically amplified positive resist containing acetal-type crosslinker of poly(3,3'-dimethoxypropene) for 193-nm top surface imaging process"

Koh,C.-W. ; Jung,J.-C. ; Kim,M.-S. ; Kong,K.-K. ; Lee,G. ; Jung,M.-H. ; Kim,J.-S. ; Shin,K.-S.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.798-803, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

5. Novel routes toward sub-70-nm contact windows by using new KrF photoresist

Kim,J.-S. ; Koh,C.-W. ; Lee,G. ; Jung,J.-C. ; Shin,K.-S.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.232-240, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

6. Novel high-performance ArF resist for sub-100-nm lithography

Lee,G. ; Koh,C.-W. ; Jung,J.-C. ; Jung,M.-H. ; Kong,K.-K. ; Kim,J.-S. ; Shin,K.-S. ; Choi,S.-J. ; Kim,Y.-S. ; Choi,Y.-J. ; Kim,D.-B.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.150-158, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

7. Comparison study on mask error factor in 100-nm ArF and KrF lithography

Eom,T.-S. ; Hyun,Y.-S. ; Kim,C.-K. ; Bok,C.-K. ; Shin,K.-S.

Pub. info.:	Optical Microlithography XIV. 4346 pp.869-878, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

8. Quantitative analysis of mask error effect on wafer CD variation in ArF lithography

Kim,S.-J. ; Koo,S.-S. ; Kim,S.-M. ; Ahn,C.-N. ; Ham,Y.-M. ; Shin,K.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.101-107, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

Conference Proceedings

9. Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography

Nam,K.-H. ; Kim,L.-J. ; Jeong,H.-S. ; Lee,S.-W. ; Lee,I.-S. ; Shin,C. ; Kim,H.-S. ; Dieu,L. ; Paek,S.W. ; Koo,S.-S. ; Bae,S.-M. ; Ham,Y.-M. ; Shin,K.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.70-80, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

10.

Conference Proceedings

10. Impact on wafer process of sub-120-nm design rule mask

Ham,Y.-M. ; Koo,S.S. ; Kim,S.J. ; Ma,W.-K. ; Shin,K.-S.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.937-947, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

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Author: Shin,K.-S.