1.

Conference Proceedings
Conference Proceedings
1. TiSi-nitride-based attenuated phase-shift mask for ArF Lithography
Koo,S.-S. ; Hur,I.-B. ; Koo,Y.-M. ; Baik,K.-H. ; Choi,I.-H. ; Kim,L.-J. ; Park,K.-T. ; Shin,C.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.969-978,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Comparison study of mask error effects for various mask-making processes
Eom,T.-S. ; Hur,I.-B. ; Koo,Y.-M. ; Baik,K.-H. ; Choi,I.-H. ; Kim,D.Y. ; Shin,C.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.734-745,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Accuracy of transmittance measurement of inspection machine for semitransparent defect and its detectability
Kim,J.B. ; Hur,I.B. ; Jeong,S.H. ; Son,Y.S. ; Lee,K.Y. ; Lee,S.W. ; Shin,C. ; Kim,H.S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.507-511,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
4.

Conference Proceedings
Conference Proceedings
4. Effect of clear field ratio on critical dimension in the dry etching process
Lee,C.-J. ; Bang,H.-S. ; Choi,J.-W. ; Jung,H.-S. ; Shin,C. ; Kim,H.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.396-400,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
5.

Conference Proceedings
Conference Proceedings
5. Zep process optimization for submicron reticle fabrication in high-acceleration voltage writing tool
Cho,J.S. ; Kim,L.-J. ; Shin,C.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.673-681,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
6.

Conference Proceedings
Conference Proceedings
6. Double-step process for manufacturing reticle to reduce gate CD variation
Kozuma,M. ; Komatsu,M. ; Arakawa,R. ; Kubo,S. ; Takahashi,T. ; Jensen,J. ; Bang,H.S. ; Lee,I.H. ; Shin,C. ; Kim,H.-S. ; Park,K.W.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.787-792,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
7.

Conference Proceedings
Conference Proceedings
7. Laser mode control using an inverse external cavity
Shin,C.
Pub. info.: High-Power Lasers: Solid State, Gas, Excimer, and Other Advanced Lasers.  pp.410-416,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2889
8.

Conference Proceedings
Conference Proceedings
8. Enhanced capability improvement using OPC pattern generation in laser lithography
Lee,I.-S. ; Nam,K.-H. ; Kim,L.-J. ; Shin,C. ; Kim,H.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.212-220,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
9.

Conference Proceedings
Conference Proceedings
9. Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography
Nam,K.-H. ; Kim,L.-J. ; Jeong,H.-S. ; Lee,S.-W. ; Lee,I.-S. ; Shin,C. ; Kim,H.-S. ; Dieu,L. ; Paek,S.W. ; Koo,S.-S. ; Bae,S.-M. ; Ham,Y.-M. ; Shin,K.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.70-80,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409