1.

Conference Proceedings
Conference Proceedings
1. Aberration sensitivity control for the isolation layer in low-k1 DRAM process
Cho, B.-H. ; Yim, D. ; Park, C.-H. ; Lee, S.-H. ; Yang, H.-J. ; Choi, J.-H. ; Shin, Y.-C. ; Kim, C.-D. ; Choi, J.-S. ; Kang, K.-O. ; Kim, S.-W. ; Yu, T.-H. ; Hong, J. ; Kim, J.-C. ; Han, M.-S. ; Heo, H.-Y. ; Kim, Y.-D. ; Lee, D.-D. ; Yoon, G.-H. ; van schoot, J.B. ; Theeuwes, T. ; Min, Y.-H.
Pub. info.: Optical Microlithography XV.  Part Two  pp.831-839,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. CD control at low K1 optical lithography in DRAM device
Hong, J. ; Woo, C. ; Park, J. ; Cho, B. ; Choi, J.-S. ; Yang, H. ; Park, C. ; Shin, Y.-C. ; Kim, Y. ; Jeong, G. ; Kim, J. ; Kang, K. ; Kang, C. ; Yim, D. ; Song, Y.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.406-414,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038