1.

Conference Proceedings
Conference Proceedings
1. Mask cost and cycle time reduction (Invited Paper)
Hsieh, H.-C. ; Hung, J.C. ; Chin, A.S.J. ; Lee, S.C. ; Shin, J.J. ; Liu, R.G. ; Lin, B.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.4-15,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Pattern recognition in the database of a mask Iayout
Chen, S.-Y. ; Lynn, E.C. ; Shin, J.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.106-115,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754