1.

Conference Proceedings
Conference Proceedings
1. The application of phase grating to CLM technology for the sub-65nm node optical lithography [5853-55]
Yoon, G.-S. ; Kim, S.-H. ; Park, J.-S. ; Choi, S.-Y. ; Jean, C.-U. ; Shin, I.-K. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.703-713,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
2.

Conference Proceedings
Conference Proceedings
2. Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF
Kang, M.-A. ; Kim, S.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1115-1124,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Phase defect printability analysis for chromeless phase lithography technology
Huh, S. ; Park, J.H. ; Chung, D.-H. ; Kim, C.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.787-795,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world
Kim, I.-S. ; Jung, S.-G. ; Kim, H.-D. ; Yeo, G.-S. ; Shin, I.-K. ; Lee, J.-H. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical Microlithography XV.  Part One  pp.466-475,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. New resolution enhancement technology for manufacturing sub-100-nm technology
Chung, D.-H. ; Park, J.-Y. ; Lee, M.-K. ; Shin, I.-K. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M. ; Chen, J.F. ; Van Den Broeke, D.J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1492-1499,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
6.

Conference Proceedings
Conference Proceedings
6. New approach for quartz dry etching using hardmask for sub-90-nm photomask technology
Huh, S. ; Yoon, K.-S. ; Jang, I.-Y. ; Hwang, J.-H. ; Shin, I.-K. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.19-27,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
7.

Conference Proceedings
Conference Proceedings
7. Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography
Park, J.-S. ; Kim, S.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M. ; Lee, J.-H. ; Shin, H.-S. ; Laidig, T.L. ; Van den Broeke, D.J. ; Chen, J.F.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.112-121,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
8.

Conference Proceedings
Conference Proceedings
8. Development of mask-making process for CLM manufacturing technology
Park, J.-H. ; Chung, D.-H. ; Lee, M.-K. ; Shin, I.-K. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M. ; Chen, J.F. ; Van Den Broeke, D.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.727-736,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754