The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.241-250, 2000. Pennington, N.J.. Electrochemical Society
Fourth International Toki Conference on Plasma Physics and Controlled Nuclear Fusion : Satio Hayakawa Memorial Conference, 17-20 November, 1992, Toki, Japan : joint Varenna-Abastumani-ESA-Nagoya Workshop on Plasma Astrophysics. pp.161-164, 1993. Paris. ESA Publications Division
High temperature corrosion and materials chemistry : proceedings of the Per Kofstad Memorial Symposium. pp.514-524, 1999. Pennington, New Jersey. Electrochemical Society
Shimura, T. ; Iwamoto, S. ; Taketomi, S. ; Arakawa, Y.H. ; Kuroda, K.
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Advanced materials and devices for sensing and imaging : 17-18 October 2002, Shanghai, China. pp.40-47, 2002. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Shimura, T. ; Fujisawa, T. ; Satoh, Y. ; Fujimura, R. ; Oda, K. ; Kuroda, K.
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Advanced materials and devices for sensing and imaging II : 8-10 November 2004, Beijing, China. pp.249-255, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Fujimura, N. ; Shimura, T. ; Wakano, T. ; Ashida, A. ; Ito, T.
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Multicomponent oxide films for electronics : symposium held April 6-8, 1999, San Francisco, California, U.S.A.. pp.317-, 1999. Warrendale, PA. MRS-Materials Research Society
Shimura, T. ; Takahash, I. ; Harada, J. ; Umeno, M.
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The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface. pp.456-467, 1996. Pennington, NJ. Electrochemical Society
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