1.

Conference Proceedings
Conference Proceedings
1. Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL technology
Lee, B. ; Hung, R. ; Lin, O. ; Wu, Y.-H. ; Kozuma, M. ; Shih, C.-L. ; Hsu, M. ; Hsu, S. D.
Pub. info.: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.114-121,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5645
2.

Conference Proceedings
Conference Proceedings
2. The Characterization of TiNi Shape-Memory Actuated Microvalves
Lai, B.-K. ; Hahm, G. ; You, L. ; Shih, C.-L. ; Kahn, H. ; Phillips, S.M. ; Heuer, A.H.
Pub. info.: Materials science of microelectromechanical systems (MEMS) devices III : symposium held November 27-28, 2000, Boston, Massachusetts, U.S.A..  2001.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 657
3.

Conference Proceedings
Conference Proceedings
3. Application of CPL mask for whole chip 5nm DRAM patterning [5853-69]
Lin, 0. ; Hung, R. ; Lee, B. ; Wu, Y.-H. ; Kozuma, M. ; Shih, C.-L. ; Lin, J. ; Hsu, M. ; Hsu, S. D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.835-843,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
4.

Conference Proceedings
Conference Proceedings
4. Effects of mask bias on the mask error enhancement factor (MEEF) for low k1 lithography process [5853-61]
Chang, Y. Y. ; Wu, Y.-H. ; Shih, C.-L. ; Lin, J. ; Kan, F. ; Lin, J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.757-766,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
5.

Conference Proceedings
Conference Proceedings
5. Alternating PSM for sub-60-nm DRAM gate single exposure [6349-66]
Chen, K. ; Lu, R. ; Fu, K. K. ; Hsia, C. ; Shih, C.-L. ; Lin, J.
Pub. info.: Photomask Technology 2006.  pp.63491T-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349