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Isotropic nitride etching for thin nitride barrier self-aligned contact (TNBSAC) in an inductively coupled plasma chemical etcher

Author(s):
  • Kim,J.-H ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
  • Ryu,J.-O. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
  • Kim,J.-S. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
  • Kim,J.-W. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
  • Seol,Y.-S ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
Publication title:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3507
Pub. Year:
1998
Page(from):
181
Page(to):
189
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429667 [081942966X]
Language:
English
Call no.:
P63600/3507
Type:
Conference Proceedings

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