1.

Conference Proceedings
Conference Proceedings
1. KrF lithography for 130 nm
Finders,J. ; Schoot,J.B.van ; Vanoppen,P. ; Dusa,M.V. ; Socha,R.J. ; Vandenberghe,G. ; Ronse,K.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.192-205,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Analysis of full-wafer/full-batch CD uniformity using electrical linewidth measurements
Vanoppen,P. ; Noordrman,O. ; Baselmans,J. ; Schoot,J.B.van
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.33-44,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
3.

Conference Proceedings
Conference Proceedings
3. Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement
Schoot,J.B.van ; Seong,N. ; Geh,B. ; Burkhardt,M. ; Graupner,P. ; Reisinger,G. ; Rubingh,R. ; Suddendorf,M. ; Finders,J. ; Rikkers,E.
Pub. info.: Optical Microlithography XIV.  4346  pp.229-240,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
4.

Conference Proceedings
Conference Proceedings
4. Can DUV take us below 100 nm?
Finders,J. ; Jorritsma,L. ; Eurlings,M. ; Moerman,R. ; Greevenbroek,H.van ; Schoot,J.B.van ; Flagello,D.G. ; Socha,R.J. ; Stammler,T.
Pub. info.: Optical Microlithography XIV.  4346  pp.153-165,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
5.

Conference Proceedings
Conference Proceedings
5. Reticle error correction for lithography tool qualification benefits and limitations
Kiers,T. ; Mulder,M. ; Schoot,J.B.van ; Waelpoel,J.A. ; Uitz,R.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.217-226,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186