1.

Conference Proceedings
Conference Proceedings
1. A new life for a 10-year old MueTec2010 CD measurement system: the ultimate precision upgrade with additional film thickness measurement capability [6281-17]
Cassol, L. G. ; Bianucci, G. ; Murai, S. ; Falk, G. ; Scheuring, G. ; Dobereiner, S. ; Bruck, -J. H.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810E-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
2.

Conference Proceedings
Conference Proceedings
2. Results of a round robin measurement on a new CD mask standard
Gans, F. ; Liebe, R. ; Richter, J. ; Schatz, Th. ; Hauffe, B. ; Hillmann, F. ; Dobereiner, S. ; Bruck, H.-J. ; Scheuring, G. ; Brendel, B. ; Bettin, L. ; Roth, K.-D. ; Steinberg, W. ; Schluter, G. ; Speckbacher, P. ; Sedlmeier, W. ; Scherubl, T. ; HaBler-Grohne, W. ; Frase, C. G. ; Czerkas, S. ; Dirscherl, K. ; Bodermann, B. ; Mirande, W. ; Bosse, H.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.122-133,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
3.

Conference Proceedings
Conference Proceedings
3. Actual measurement data obtained on new 65nm generation mask metrology toot set
Bender, J. ; Ferber, M. ; Roth, K.-D. ; Schluter, G. ; Steinberg, W. ; Scheuring, G. ; Hillmann, F.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.134-144,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
4.

Conference Proceedings
Conference Proceedings
4. DUV water immersion technology extends linearity: first results from the new 65nm node CD metrology system LWM500 WI
Hillmann, F. ; Dobereiner, S. ; Gittinger, C. ; Reiter, R. ; Falk, G. ; Bruck, H.-J. ; Scheuring, G. ; Bosser, A. ; Heiden, M. ; Hoppen, G. ; Sulik, W. ; Voilrath, W.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.167-177,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
5.

Conference Proceedings
Conference Proceedings
5. New UV-capable photomask CD metrology tool
Schlueter, G. ; Brueck, H. -J. ; Birkenmayer, S. ; Falk, G. ; Scheuring, G. ; Walden, L. ; Lehnigk, S.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.592-598,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
6.

Conference Proceedings
Conference Proceedings
6. Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results
Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Brueck, H.-J. ; Chen, S.-B. ; Chen, P.W. ; Hartmann, H. ; Ordynskyy, V. ; Jonckheere, R.M. ; Philipsen, V. ; Schaetz, T. ; Sommer, K.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.168-174,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
7.

Conference Proceedings
Conference Proceedings
7. Implementation of 248-nm based CD metrology for advanced reticle production
Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Doebereiner, S. ; Hillmann, F. ; Brueck, H.-J. ; Hartmann, H. ; Ordynskyy, V. ; Peter, K. ; Chen, S.-B. ; Chen, P.W. ; Jonckheere, R.M. ; Philipsen, V. ; Schaetz, T. ; Sommer, K.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.148-157,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
8.

Conference Proceedings
Conference Proceedings
8. Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment
Jonckheere, R.M. ; Philipsen, V. ; Scheuring, G. ; Hillmann, F. ; Brueck, H.-J. ; Ordynskyy, V. ; Peter, K. ; Hourd, A.C. ; Schaetz, T. ; Chen, S.-B. ; Chen, P.W. ; Sommer, K.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.158-168,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
9.

Conference Proceedings
Conference Proceedings
9. Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool
Scheuring, G. ; Petrashenko, A. ; Doebereiner, S. ; Hillmann, F. ; Brucek, H.-J. ; Hourd, A.C. ; Grimshaw, A. ; Hughes, G. ; Chen, S.-B. ; Chen, P.W. ; Schaetz, T. ; Struck, T. ; Van Adrichem, P.J.M. ; Boerland, H. ; Lehnigk, S.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.138-147,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
10.

Conference Proceedings
Conference Proceedings
10. Reliable subnanometer repeatability for CD metrology in a reticle production environment
Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Doebereiner, S. ; Hillmann, F. ; Brueck, H.-J. ; Chen, S.-B. ; Chen, P.W. ; Jonckheere, R.M. ; Philipsen, V. ; Hartmann, M. ; Ordynskyy, V. ; Peter, K. ; Schaetz,T. ; Sommer, K.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.319-327,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889