1.

Conference Proceedings
Conference Proceedings
1. Recent experiments in trapped-ion quantum information processing of NIST [6256-36]
Chiaverini, J. ; Barrett, M. D. ; Blakestad, R. B. ; Britton, J. ; Itano, W. ; Jost, J. D. ; Knill, E. ; Langer, C. ; Leibfried, D. ; Ozeri, R. ; Schaetz, T. ; Wineland, D. J.
Pub. info.: ICONO 2005 : ultrafast phenomena and physics of superintense laser fields, quantum and atom optics, engineering of quantum information : 11-15 May 2005, St. Petersburg, Russia.  pp.625610-625610,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6256
2.

Conference Proceedings
Conference Proceedings
2. Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results
Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Brueck, H.-J. ; Chen, S.-B. ; Chen, P.W. ; Hartmann, H. ; Ordynskyy, V. ; Jonckheere, R.M. ; Philipsen, V. ; Schaetz, T. ; Sommer, K.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.168-174,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
3.

Conference Proceedings
Conference Proceedings
3. Implementation of 248-nm based CD metrology for advanced reticle production
Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Doebereiner, S. ; Hillmann, F. ; Brueck, H.-J. ; Hartmann, H. ; Ordynskyy, V. ; Peter, K. ; Chen, S.-B. ; Chen, P.W. ; Jonckheere, R.M. ; Philipsen, V. ; Schaetz, T. ; Sommer, K.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.148-157,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
4.

Conference Proceedings
Conference Proceedings
4. Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment
Jonckheere, R.M. ; Philipsen, V. ; Scheuring, G. ; Hillmann, F. ; Brueck, H.-J. ; Ordynskyy, V. ; Peter, K. ; Hourd, A.C. ; Schaetz, T. ; Chen, S.-B. ; Chen, P.W. ; Sommer, K.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.158-168,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
5.

Conference Proceedings
Conference Proceedings
5. Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool
Scheuring, G. ; Petrashenko, A. ; Doebereiner, S. ; Hillmann, F. ; Brucek, H.-J. ; Hourd, A.C. ; Grimshaw, A. ; Hughes, G. ; Chen, S.-B. ; Chen, P.W. ; Schaetz, T. ; Struck, T. ; Van Adrichem, P.J.M. ; Boerland, H. ; Lehnigk, S.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.138-147,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
6.

Conference Proceedings
Conference Proceedings
6. Development and characterization of new CD mask standards: a status report
Schaetz, T. ; Hauffe, B. ; Doebereiner, S. ; Brueck, H.-J. ; Brendel, B. ; Bettin, L. ; Roeth, K.-D. ; Steinberg, W. ; Speckbacher, P. ; Sedlmeier, W. ; Engel, T. ; Haessler-Grohne, W. ; Mirande, W. ; Bosse, H.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.42-53,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148