Single layer fluropolymer resists for 157-nm lithography
- Author(s):
Crawford, M.K. ( DuPont Co. (USA) ) Farnham, W.B. ( DuPont Co, (USA) ) Feiring, A.E. ( Dupont Co. (USA) ) Feldman, J. ( DuPont Co. (USA) ) French, R.H. ( DuPont Co. (USA) ) Leffew, K.W. ( DuPont Co (USA) ) Petrov, V.A. ( DuPont Co. (USA) ) Qiu, W. ( DuPont Co. (USA) ) Schadt, F.L. ( DuPont Co. (USA) ) Tran, H.V. ( DuPont Co. (USA) ) Wheland, R.C. ( DuPont Co. (USA) ) Zumsteg, F.C. Jr., ( DuPont Co. (USA) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 1
- Pt.:
- Session 3
- Page(from):
- 80
- Page(to):
- 92
- Pages:
- 13
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Fluoropolyrners for 157-nm lithography:optical properties from VUV absorbance and ellipsometry measurements
SPIE - The International Society for Optical Engineering |
8
Conference Proceedings
Behavior of candidate organic pellicle materials under 157-nm laser irradiation
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
157-nm pellicles for photolithography: mechanistic investigation of the deep-UV photolysis of fluorocarbons
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |