1.

Conference Proceedings
Conference Proceedings
1. Screening of DNQ/novolac resists with e-beam exposure
Fedynyshyn, T. N. ; Doran, S. P. ; Lind, M. L. ; Lyszczarz, T. M. ; DiNatale, W. F. ; Lennon, D. ; Sauer, C. A. ; Muete, J.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.1273-1283,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Design considerations for an electron-beam pattern generator for the 130-nm generation of masks
Abboud, F. E. ; Babin, S. V. ; Chakarian, V. ; Ghanbari, A. ; Innes, R. ; Raymond III, F. ; Sagle, A. L. ; Sauer, C. A.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.385-399,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
3.

Conference Proceedings
Conference Proceedings
3. Fabrication of MoSiON halftone masks using ZEP7000 for MEBES 4500
Maetoko, K. ; Tange, K. ; Fukuma, H. ; Yoshioka, N. ; Kawada, S. ; Ishizuka, M. ; Sasaki, T. ; Sauer, C. A.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.350-357,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
4.

Conference Proceedings
Conference Proceedings
4. Electron-beam lithography simulation for maskmaking: IV. Effect of resist contrast on isofocal dose
Sauer, C. A. ; Mack, C. A.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.27-40,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748