Mui, D.S.L. ; Sasano, H. ; Liu, W. ; Yamartino, J. ; Skumanich, A.
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Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA. pp.10-17, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Yang, W. ; Lowe-Webb, R. ; Korlahalli, R. ; Zhuang, V.G. ; Sasano, H. ; Liu, W. ; Mui, D.
Pub. info.:
Metrology, Inspection, and Process Control for Microlithography XVI. Part Two pp.966-976, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering