1.

Conference Proceedings
Conference Proceedings
1. Line edge roughness reduction by plasma curing photoresists
Sanada, M. ; Tamada, O. ; Ishikawa, A. ; Kawai, A.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.380-389,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Origin of LER and its solution
Tamada, O. ; Sanada, M.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.390-399,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
3.

Conference Proceedings
Conference Proceedings
3. INVITED: HYDROGEN ANNEAL OF SILICON WAFER FORMATION OF HIGH QUALITY DEVICE ACTIVE LAYER
Matsushita, Y. ; Sanada, M. ; Tanabe, A. ; Takeda, R. ; Shimaoi, N. ; Kobayashi, K.
Pub. info.: Silicon materials science and technology : proceedings of the Eighth International Symposium on Silicon Materials Science and Technology.  pp.683-697,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-1(1)
4.

Conference Proceedings
Conference Proceedings
4. Effect of Initial Grain Size on Deformation Behavior and Dynamic Recrystallization of Magnesium Alloy AZ31
Yang, X. ; Sanada, M. ; Miura, H. ; Sakai, T.
Pub. info.: Magnesium-science, technology and applications : proceedings of the International Conference on Magnesium-Science, Technology and Applications September 20-24, 2004, Beijing, China.  pp.223-226,  2005.  Uetikon-Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 488-489
5.

Conference Proceedings
Conference Proceedings
5. Effect of post development process for resist roughness
Tamada, O. ; Sanada, M. ; Ishikawa, A. ; Niiyama, T. ; Kawai, A.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.400-407,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
6.

Conference Proceedings
Conference Proceedings
6. A novel contact hole shrink process for the 65-nm node and beyond
Kawai, A. ; Ishikawa, A. ; Niiyama, T. ; Harumoto, M. ; Tamada, O. ; Sanada, M.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.195-205,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
7.

Conference Proceedings
Conference Proceedings
7. Short develop time process with novel develop application system
Sanada, M. ; Tamada, O. ; Harumoto, M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1243-1254,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
8.

Conference Proceedings
Conference Proceedings
8. Improvement of resist process margin with short develop time process
Tamada, O. ; Sanada, M.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.770-780,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039