1.

Conference Proceedings
Conference Proceedings
1. A new 193nm resist
Hirayama, T. ; Shiono, D. ; Matsumaru, S. ; Ogata, T. ; Hada, H. ; Onodera, J. ; Arai, T. ; Sakamizu, T. ; Yamaguchi, A. ; Shiraishi, H. ; Fukuda, H. ; Ueda, M.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.122-130,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Improvement of post-exposure delay stability of chemically amplified positive resist
Katoh, K. ; Kasuya, K. ; Hashimoto, M. ; Arai, T. ; Sakamizu, T.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.62-68,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
3.

Conference Proceedings
Conference Proceedings
3. Surface and line-edge roughness in acid-breakable resin-based positive resist
Sakamizu, T. ; Shiraishi, H.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.492-501,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039