1.

Conference Proceedings
Conference Proceedings
1. Multilevel imaging system realizing k1=0.3 lithography
Suzuki,A. ; Saitoh,K. ; Yoshii,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.396-407,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. IDEAL double exposure method for polylevel structures
Romeo,C. ; Canestrari,P. ; Fiorino,A. ; Hasegawa,M. ; Saitoh,K. ; Suzuki,A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.240-251,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Current status of the SR stepper development(Invited Paper)
Mizusawa,N. ; Watanabe,Y. ; Hara,S. ; Saitoh,K. ; Maehara,H. ; Amemiya,M. ; Uzawa,S.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.230-239,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
4.

Conference Proceedings
Conference Proceedings
4. Vertical distribution of phytoplankton by satellite data and its application to fisheries
Saitoh,K. ; Saitoh,S. ; Tameishi,H.
Pub. info.: Hyperspectral remote sensing of the ocean : 9-11 October 2000, Sendai, Japan.  pp.166-173,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4154
5.

Conference Proceedings
Conference Proceedings
5. Practical applications of IDEAL exposure method
Hasegawa,M. ; Saitoh,K. ; Yoshii,M. ; Suzuki,A.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.66-77,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
6.

Conference Proceedings
Conference Proceedings
6. Generation Mechanisms of Trapped Charges in Oxide Layers of 6H-SiC MOS Structures Irradiated with Gamma-Rays
Yoshikawa,M. ; Saitoh,K. ; Ohshima,T. ; Itoh,H. ; Nashiyama,I. ; Takahashi,Y. ; Ohnishi,K. ; Okumura,H. ; Yoshida,S.
Pub. info.: Silicon carbide, III-nitrides and related materials, ICSCIII-N'97 : proceedings of the International Conference on Silicon Carbide, III-Nitrides and Related Materials, Stockholm, Sweden, September 1997.  Part2  pp.1017-1020,  1998.  Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 264-268
7.

Conference Proceedings
Conference Proceedings
7. Convergent-Beam Electron Diffraction and Electron Microscope Studies on Decagonal Quasicrystals of Al-Ni-Fe and Al-Cu-Co Alloys
Tsuda,K. ; Saito,M. ; Saitoh,K. ; Terauchi,M. ; Tanaka,M. ; Tsai,A.P. ; Inoue,A. ; Masumoto,T.
Pub. info.: Quasicrystals and imperfectly ordered crystals.  pp.255-266,  1994.  Aedermannsdorf, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 150-151
8.

Conference Proceedings
Conference Proceedings
8. Application of SR lithography to 0.14-ｦﾌm device fabrication
Sumitani,H. ; Itoga,K. ; Shimano,H. ; Aya,S. ; Yabe,H. ; Hifumi,T. ; Watanabe,H. ; Kise,K. ; Inoue,M. ; Marumoto,K. ; Nishioka,Y. ; Abe,H. ; Mizusawa,N. ; Saitoh,K. ; Uzawa,S.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.222-236,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723