1.

Conference Proceedings
Conference Proceedings
1. Chip-level line-width prediction methodology
LaCour, P. ; Sahouria, E.Y. ; Granik, Y.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.328-335,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
2.

Conference Proceedings
Conference Proceedings
2. High-performance fracturing for variable shaped beam mask writing machines
Schulze, S.F. ; Sahouria, E.Y. ; Miloslavsky, E.A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.648-659,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Model-based OPC considering process window aspects: a study
Schulze, S.F. ; Park, O. ; Zimmermann, R. ; Chen, M.-J. ; LaCour, P. ; Sahouria, E.Y. ; Granik, Y. ; Cobb, N.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1097-1105,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. OASIS-based unification of mask data representation
Sahouria, E.Y. ; Schulze, S.F.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.431-438,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446