1.

Conference Proceedings
Conference Proceedings
1. Scatterometry on pelliclized masks: an option for wafer fabs
E. Gallagher ; C. Benson ; M. Higuchi ; Y. Okumoto ; M. Kwon ; S. Yedur ; S. Li ; S. Lee ; M. Tabet
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. Scatterometry measurement of nested lines, dual space, and rectangular contact CD on phase-shift masks
K. M. Lee ; S. Yedur ; S. Henrichs ; M. Tavassoli ; K. Baik
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518