1.

Conference Proceedings
Conference Proceedings
1. Double pattern EDA solutions for 32nm HP and beyond
G. E. Bailey ; A. Tritchkov ; J. Park ; L. Hong ; V. Wiaux ; E. Hendrickx ; S. Verhaegen ; P. Xie ; J. Versluijs
Pub. info.: Design for manufacturability through design-process integration.  6521  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521
2.

Conference Proceedings
Conference Proceedings
2. Lithography and yield sensitivity analysis of SRAM scaling for the 32nm node
A. Nackaerts ; S. Verhaegen ; M. Dusa ; H. Kattouw ; F. van Bilsen ; S. Biesemans ; G. Vandenberghe
Pub. info.: Design for manufacturability through design-process integration.  6521  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521
3.

Conference Proceedings
Conference Proceedings
3. Double patterning design split implementation and validation for the 32nm node
M. Drapeau ; V. Wiaux ; E. Hendrickx ; S. Verhaegen ; T. Machida
Pub. info.: Design for manufacturability through design-process integration.  6521  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521
4.

Conference Proceedings
Conference Proceedings
4. Litho variations and their impact on the electrical yield of a 32nm node 6T SRAM cell
S. Verhaegen ; S. Cosemans ; M. Dusa ; P. Marchal ; A. Nackaerts
Pub. info.: Design for manufacturability through design-process integration II.  pp.69250R-1-69250R-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6925
5.

Conference Proceedings
Conference Proceedings
5. Split and design guidelines for double patterning
V. Wiaux ; S. Verhaegen ; S. Cheng ; F. Iwamoto ; P. Jaenen
Pub. info.: Optical Microlithography XXI.  1  pp.692409-1-692409-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
6.

Conference Proceedings
Conference Proceedings
6. A methodology for double patterning compliant split and design
V. Wiaux ; S. Verhaegen ; F. Iwamoto ; M. Maenhoudt ; T. Matsuda
Pub. info.: Lithography Asia 2008.  1  pp.71401X-1-71401X-14,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140