1.

Conference Proceedings
Conference Proceedings
1. Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2
S. Mimotogi ; F. Uesawa ; M. Tominaga ; H. Fujise ; K. Sho ; M. Katsumata ; H. Hane ; A. Ikegami ; S. Nagahara ; T. Ema ; M. Asano ; H. Kanai ; T. Kimura ; M. Iwai
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. 45nm node logic device OPE matching between exposure tools through laser bandwidth tuning
K. Yoshimochi ; T. Tamura ; S. Nagahara ; T. Uchiyama ; N. Farrar
Pub. info.: Optical Microlithography XXI.  2  pp.69242K-1-69242K-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
3.

Conference Proceedings
Conference Proceedings
3. Optical imaging of RNAi-mediated silencing of cancer
T. Ochiya ; K. Honma ; F. Takeshita ; S. Nagahara
Pub. info.: Small animal whole-body optical imaging based on genetically engineered probes : 21-22 January 2008, San Jose, California, USA.  pp.68680H-1-68680H-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6868