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22 results

Conference Proceedings

1. SELECTIVE-AREA LASER PHOTODEPOSITION OF TRANSPARENT CONDUCTIVE SnO2 FILMS

Kunz, R.R. ; Rothschild, M. ; Ehrlich, D.J.

Pub. info.:	Laser and particle-beam chemical processes on surfaces : symposium held November 29-December 2, 1988, Boston, Massachusetts, U.S.A.. pp.447-454, 1989. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	129

Conference Proceedings

2. VISIBLE-WAVELENGTH LASER PHOTODEPOSITION OF COBALT INTERCONNECTS

Rothschild, M. ; Sedlacek, J.H.C. ; Shaver, D.C. ; Ehrlich, D.J. ; Bittenson, S.N. ; Edwards, Jr., D. ; Economou, N.P.

Pub. info.:	In-situ patterning : selective area deposition and etching : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A.. pp.79-84, 1990. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	158

Conference Proceedings

3. UV ENHANCEMENT OF SURFACE CATALYTIC POLYMERIZATION OF ETHYLENE

Purohit, P.V. ; Rothschild, M. ; Ehrlich, D.J.

Pub. info.:	Laser and particle-beam chemical processes on surfaces : symposium held November 29-December 2, 1988, Boston, Massachusetts, U.S.A.. pp.259-268, 1989. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	129

Conference Proceedings

4. *OPTICAL CONSIDERATIONS FOR EXCIMER PROJECTION SYSTEMS

Rothschild, M. ; Ehrlich, D. J.

Pub. info.:	Laser and particle-beam chemical processing for microelectronics : symposium held December 1-3, 1987, Boston, Massachusetts, USA. pp.13-20, 1988. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	101

Conference Proceedings

5. GaAs CIRCUIT RESTRUCTURING BY MULTI-LEVEL LASER-DIRECT-WRITTEN TUNGSTEN PROCESS

Black, J.G. ; Doran, S.P. ; Rothschild, M. ; Sedlack, J.H.C. ; Ehrlich, D.J.

Pub. info.:	Photon, beam, and plasma stimulated chemical processes at surfaces : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A.. pp.651-656, 1987. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	75

Conference Proceedings

6. Testing of optical materials for 193-nm applications

Liberman, V. ; Rothschild, M. ; Sedlacek, J.H.C. ; Uttaro, R.S. ; Grenville, A. ; Bates, A.K. ; Van Peski, C.

Pub. info.:	Optical systems contamination and degradation : 20-23 July 1998, San Diego, California. pp.411-418, 1998. Bellingham, Wash., USA. SPIE
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3427

Conference Proceedings

7. The improvement of the overlay accuracy using the reticle distortion correction for EPL technologies

Fritze, M. ; Tyrrell, B. ; Fedynyshyn, T. ; Rothschild, M. ; Brooker, P.

Pub. info.:	Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA. pp.483-490, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5751

Conference Proceedings

8. Studies of consequences of photo-acid generator leaching in 193-nm immersion lithography [6154-43]

Liberman, V. ; Switkes, M. ; Rothschild, M. ; Palmacci, S. T. ; Grenville, A.

Pub. info.:	Optical Microlithography XIX. pp.615416-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

Conference Proceedings

9. Contamination rates of optical surfaces at 157 nm: impurities outgassed from construction materials and from photoresists

Bloomstein, T.M. ; Sedlacek, J.H.C. ; Palmacci, S.T. ; Hardy, D.E. ; Liberman, V. ; Rothschild, M.

Pub. info.:	Optical Microlithography XVI. Part One pp.650-661, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

10.

Conference Proceedings

10. Immersion liquids for lithography in the deep ultraviolet

Switkes, M. ; Kunz, R.R. ; Sinta, R.F. ; Rothschild, M. ; Gallagher-Wetmore, P.M. ; Krukonis, V.J. ; Williams, K.

Pub. info.:	Optical Microlithography XVI. Part Two pp.690-699, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

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