pVD High-k Gate Dielectrics with FUSI Gate and Influence of PDA Treatment on On-State Drive Current
- Author(s):
Niwa, M. Mitsuhashi, R. Yamamoto, K. Hayashi, S. Rothchild, A. Kubicek, S. De Gendt, S. Biesemans, S. - Publication title:
- Defects in high-κ gate dielectric stacks : nano-electronic semiconductor devices
- Title of ser.:
- NATO science series. Series 2, Mathematics, physics and chemistry
- Ser. no.:
- 220
- Pub. Year:
- 2006
- Page(from):
- 1
- Page(to):
- 17
- Pages:
- 17
- Pub. info.:
- Dordrecht: Springer
- ISBN:
- 9781402043659 [1402043651]
- Language:
- English
- Call no.:
- N17050/220
- Type:
- Conference Proceedings
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