1.

Conference Proceedings
Conference Proceedings
1. Sub 0.25μm Lithography Using Deep-UV and Optical Enhancement Techniques
van den Hove, L. ; Ronse, K.
Pub. info.: ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology.  pp.503-514,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-3
2.

Conference Proceedings
Conference Proceedings
2. Progress in 193nm immersion lithography at IMEC
Ronse, K. ; Vandenberghe, G. ; Hendrickx, E. ; Leunissen, L. H. A. ; Aksenov, Y.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.6-12,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
3.

Conference Proceedings
Conference Proceedings
3. AttPSM CD control: mask bias and flare effects
Kim. Y.-C. ; Vandenberghe, G. ; Ronse, K.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1041-1053,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Assessment of OPC effectiveness using two-dimensional metrics
Wiaux, V. ; Philipsen, V. ; Jonckheere, R. ; Vandenberghe, G. ; Verhaegen, S. ; Hoffmann, T. ; Ronse, K. ; Howard, W.B. ; Maurer, W. ; Preil, M.E.
Pub. info.: Optical Microlithography XV.  Part One  pp.395-406,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691