1.

Conference Proceedings
Conference Proceedings
1. Characterization of a positive chemically amplified photoresist for process control
Jakatdar,N.H. ; Niu,X. ; Spanos,C.J. ; Romano,A.R. ; Bendik,J.J. ; Kovacs,R.P. ; Hill,S.L.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.586-593,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Physically based model for predicting volume shrinkage in chemically amplified resists
Jakatdar,N.H. ; Bao,J. ; Spanos,C.J. ; Subramanian,R. ; Rangarajan,B. ; Romano,A.R.
Pub. info.: In-line characterization, yield reliability, and failure analysis in microelectronics manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.16-24,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3743
3.

Conference Proceedings
Conference Proceedings
3. "Toward 0.1-μm contacd hole process by using water soluble organic overcoating material (WASOOM)―Resist flow technology ？: study on WASOOM, top flare, and etch characterization"
Chun,J.-S. ; Maeng,C.H. ; Tesauro,M.R. ; Sturtevant,J. ; Oberlander,J.E. ; Romano,A.R. ; Sagan,J.P. ; Dammel,R.R.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.647-654,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
4.

Conference Proceedings
Conference Proceedings
4. Transparent resins for 157-nm lithography
Dammel,R.R. ; Sakamuri,R. ; Romano,A.R. ; Vicari,R. ; Hacker,C. ; Conley,W. ; Miller,D.A.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.350-360,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
5.

Conference Proceedings
Conference Proceedings
5. 193-nm photoresist shrinkage after electron-beam exposure
Su,B. ; Eytan,G. ; Romano,A.R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.695-706,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344