1.

Conference Proceedings
Conference Proceedings
1. DETERMINATION OF NATIVE OXIDE REMOVAL IN CLUSTER COMPATIBLE DRY CLEANING SYSTEMS USING A SURFACE PHOTOVOLTAGE TECHNIQUE
Brubaker, M. ; Staffa, J. ; Roman, P. ; Fakhouri, S. ; Ruzyllo, J.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.408-414,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
2.

Conference Proceedings
Conference Proceedings
2. Processing of Thick Thermal Gate Oxides in Trenchs
Wu, C.T. ; Ridley, R. ; Dolny, G. ; Grebs, T. ; Hao, J. ; Suliman, S. ; Venkataraman, B. ; Awadelkarim, O. ; Williams, R. ; Roman, P. ; Ruzyllo, J.
Pub. info.: Silicon Nitride and Silicon Dioxide Thin Insulating Films : proceedings of the sixth International Symposium.  pp.127-133,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-7
3.

Conference Proceedings
Conference Proceedings
3. MONITORING OF Fe CONTAMINATION ON Si SURFACES USING NON-CONTACT SURFACE CHARGE PROFILER
Roman, P. ; Kashkoush, I. ; Novak, R.E. ; Kamieniecki, E. ; Ruzyllo, J.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.344-349,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
4.

Conference Proceedings
Conference Proceedings
4. LOW-TEMPERATURE ATMOSPHERIC AMBIENT RAPID LAMP CLEANING OF SILICON SURFACES
Roman, P. ; Tsai, C.-L. ; Hengstebeck, R. ; Pantano, C. ; Berry, J. ; Kamieniecki, E. ; Ruzyllo, J.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.145-149,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
5.

Conference Proceedings
Conference Proceedings
5. THICKNESS DEPENDENT SENSITIVITY OF GATE OXIDES TO SURFACE CONTAMINATION
Ridley, R. ; Wu, C.-T. ; Roman, P. ; Dolny, G. ; Grebs, T. ; Stensney, F. ; Ruzyllo, J.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.158-164,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
6.

Conference Proceedings
Conference Proceedings
6. Studies of High-k Gate Dielectrics Deposited hy the Liquid Source Misted Chemical Deposition Method
Lee, D. ; Roman, P. ; Mumbauer, P. ; Grant, R. ; Horn, M. ; Ruzyllo, J.
Pub. info.: Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium.  pp.237-242,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-5
7.

Conference Proceedings
Conference Proceedings
7. Mist deposition of thin photoresist films
Mahoney, W.J. ; Roman, P. ; Mumbauer, P. ; Ruzyllo, J.
Pub. info.: Advances in resist technology and processing XXI.  pp.861-866,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
8.

Conference Proceedings
Conference Proceedings
8. EFFECTS CONTROLLING INITIATION AND TERMINATION OF GAS-PHASE CLEANING REACTIONS
Staffa, J. ; Fakhouri, S. ; Brubaker, M. ; Roman, P. ; Ruzyllo, J.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.315-321,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
9.

Conference Proceedings
Conference Proceedings
9. Characterization of High-K Dielectrics Using the Non-Contact Surface Charge Profiler (SCP) Method
Roman, P. ; Lee, D. ; Mumbauer, P. ; Grant, R. ; Kamieniecki, E. ; Ruzyllo, J.
Pub. info.: Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium.  pp.187-192,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-5
10.

Conference Proceedings
Conference Proceedings
10. STUDY OF THE EFFECT OF SILICON SURFCE TREATMENT ON EOT IN HIGH-k DIELECTRIC MOS GATE STACK
Chang, K. ; Shanmugasundaram, K. ; Lee, D.-O. ; Roman, P. ; Shallenberger, J. ; Chang, F.-M. ; Wang, J. ; Beck, R. ; Mumbauer, P. ; Grant, R. ; Ruzyllo, J.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.78-85,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26