1.

Conference Proceedings
Conference Proceedings
1. Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node
Patterson, K. ; Litt, L.C. ; Maltabes, J.G. ; Hughes, G.P. ; Robertson, T. ; Montgomery, B.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1033-1040,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Technical Paper
Technical Paper
2. Advances in Cross-Contamination Control Using Single-Wafer High-Current Implantation.
Todorov, S.S. ; Eddy, R. ; Bertuch, A. ; Robertson, T. ; Piscitello, W.
Pub. info.: SME technical paper.  2003.  Society of Manufacturing Engineers